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Sr. Mask / Reticle Engineer
| Company | Intel |
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| Location | Phoenix, AZ, USA |
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| Salary | $130300 – $183950 |
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| Type | Full-Time |
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| Degrees | Bachelor’s |
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| Experience Level | Senior |
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Requirements
- Candidate must possess at a minimum a Bachelor of Science degree in a related science or engineering field with 7 years of process engineering experience in wafer fabrication.
- Ideal candidate will have a minimum of 5 years of reticle lithography experience in: Process flow, equipment troubleshooting and Model Based Problem Solving skills.
- Interacting with vendor field service engineering support and manufacturing/engineering technicians on toolsets.
- Providing technical direction on quality issues.
- Advanced data analysis.
- Lithography theory.
- US citizenship required.
- Ability to obtain and maintain a US Government Security Clearance.
Responsibilities
- Ensuring sufficient safety and workplace organization of the area and ensuring copy exactly matching of eqp configuration, parameters, and targeting to a defined standard.
- Regular review of Reticle Inspection equipment and availability ensuring equipment matching and repeatability.
- Driving continuous improvement in the tool health and process matching of the reticle platforms by utilizing Virtual Factory BIC performance shared learnings, continuous improvement projects, developing, maintaining, and executing improvement roadmap across all the different factory pillars while optimizing process parameters.
- Driving continuous improvements on Mask health and defect containment to prevent excursions and ensure reticles are of the highest quality standards. This includes applying constant learnings with virtual factory partners and throughout mask shop creation.
- Applying model-based problem solving to identify root cause of reticle changes, mismatches from target, monitor failures, or Print changes; and then developing permanent solutions to prevent repeat occurrences.
- Conducting tests and measurements to determine control over such variables as Photo Induced defects, Environmental changes, Mask creation variability, and yield marginalities.
- For new technology start-ups, managing tool installations, conversions, and qualifications plus delivering sigma matched performance and recipe matching.
- Developing Systems to help model Reticle changes and monitor reticle health.
Preferred Qualifications
- Similarly, candidate may possess an M.S. degree or Ph.D. with 5 years’ experience.
- Technical expertise on photolithography Reticle Equipment and risk models and be able to provide technical direction on quality issues, lithography matching performance and Lithography yield improvement.
- Understanding of Reticle print risks and ability to understand interactions with lithography patterning equipment such as EUV and environmental and processing impacts.
- Knowledge of immersion lithography processes and EUV processing and reticle interactions.
- Experience working in a Mask shop with focus on processing and yield.
- Knowledge of Manufacturing science, Capacity Metrics, In-line and EOL defect and excursion prevention/response.
- Experience in leading senior, cross function/cross organization teams.
- Experience in Data analysis (JMP, SPC, MATLAB, Mathematica) and Design of experiment (DOE) principles and pilot testing methodologies.
- Previous or current Intel Engineering experience, and knowledge of Intel systems and processes will be considered a plus factor when evaluating candidates for this position. Having a strong working relationship with Lithography virtual factory/PTD/IMO is considered a plus.
- Prior experience working with US Government contracts.
- Active US Government Security Clearance, with a minimum of Secret level.
